M Yanagisawa et al 2009 J. Phys.: Conf. Ser. 191 012007 doi:10.1088/1742-6596/191/1/012007
M Yanagisawa1,3, Y Tsuji1, H Yoshinaga1, K Hiratsuka1 and J Taniguchi2
Show affiliationsWe have succeeded in employing nanoimprint lithography (NIL) to form the diffraction gratings of distributed feedback laser diodes (DFB LDs) used in optical communication. Uniform gratings and phase-shifted gratings with periods of 232 nm have been formed by using a reverse NIL with a step-and-repeat imprint tool. Line edge roughness has been sufficiently low with the fabricated gratings. DFB LDs fabricated by NIL have indicated comparable characteristics with LDs fabricated by electron beam lithography. We have also demonstrated that phase-shifted DFB LDs show better uniformity in characteristics than uniform-grating DFB LDs. The results of this study indicate that NIL has high potential for the fabrication of DFB LDs.
42.55.Px Semiconductor lasers; laser diodes
84.40.Ua Telecommunications: signal transmission and processing; communication satellites
42.82.Cr Fabrication techniques; lithography, pattern transfer
42.79.Sz Optical communication systems, multiplexers, and demultiplexers
Issue 1 (2009)
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