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High-density and narrow size-distribution InAs quantum dots formed by a modified two-step growth

Huang She-Song1, Niu Zhi-Chuan1, Zhan Feng2, Ni Hai-Qiao1, Zhao Huan1, Wu Dong-Hai1 and Sun Zheng1

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We develop a modified two-step method of growing high-density and narrow size-distribution InAs/GaAs quantum dots (QDs) by molecular beam epitaxy. In the first step, high-density small InAs QDs are formed by optimizing the continuous deposition amount. In the second step, deposition is carried out with a long growth interruption for every 0.1 InAs monolayer. Atomic force microscope images show that the high-density (~5.9×1010 cm−2) good size-uniformity InAs QDs are achieved. The strong intensity and narrow linewidth (27.7 meV) of the photoluminescence spectrum show that the QDs grown in this two-step method have a good optical quality.


PACS

68.65.Hb Quantum dots (patterned in quantum wells)

78.55.Cr III-V semiconductors

68.37.Ps Atomic force microscopy (AFM)

78.67.Hc Quantum dots

81.15.Hi Molecular, atomic, ion, and chemical beam epitaxy

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Dates

Issue 1 (January 2008)

Received 10 April 2007, in final form 4 July 2007



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