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Quantum lithography, entanglement and Heisenberg-limited parameter estimation

Pieter Kok1, Samuel L Braunstein2 and Jonathan P Dowling3

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We explore the intimate relationship between quantum lithography, Heisenberg-limited parameter estimation and the rate of dynamical evolution of quantum states. We show how both the enhanced accuracy in measurements and the increased resolution in quantum lithography follow from the use of entanglement. Mathematically, the hyper-resolution of quantum lithography appears naturally in the derivation of Heisenberg-limited parameter estimation. We also review recent experiments offering a proof of the principle of quantum lithography, and we address the question of state preparation and the fabrication of suitable photoresists.


PACS

42.50.Dv Quantum state engineering and measurements

Subjects

Optics, quantum optics and lasers

Dates

Issue 8 (August 2004)

Received 14 November 2003, accepted for publication 10 February 2004

Published 27 July 2004



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