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Femtosecond-laser induced formation of grating structures in planar polymer substrates

C Wochnowski1,3, Y Cheng2, K Meteva1, K Sugioka2, K Midorikawa2 and S Metev1

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Grating structures are fabricated in polymer substrates by femtosecond- (fs-) IR-laser radiation. Several sorts of polymer are employed as polymeric basic material for the grating manufacture: polymethylmethacrylate (PMMA), fluorinated PMMA, poly-N-methyl methacrylimide (PMMI), polycarbonate (PC), polyimide (PI) and polysiloxane. Surface and volume gratings are fabricated by positioning the focus of the fs-laser beam directly on the surface or inside the volume of the polymeric substrate, so by the right choice of the irradiation parameters the irradiated zone of the substrate is ablated, modified or carbonized. The sample is moved according to a scanning algorithm in order to generate the grating structure. The diffraction efficiency of the grating samples is measured by a HeNe laser. Some proposals are given for the mechanism of the grating generation.


PACS

42.62.-b Laser applications

42.79.Dj Gratings

42.70.Jk Polymers and organics

42.86.+b Optical workshop techniques

Subjects

Soft matter, liquids and polymers

Optics, quantum optics and lasers

Dates

Issue 9 (September 2005)

Received 8 April 2005, accepted for publication 16 May 2005

Published 9 August 2005



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