Quick search Find article
Quick search
Find article

Improved near field lithography by surface plasmon resonance in groove-patterned masks

Beibei Zeng, Li Pan, Ling Liu, Liang Fang, Changtao Wang and Xiangang Luo

Show affiliations


Near field lithography (NFL) provides an effective way for obtaining lithography features' sizes far beyond the diffraction limit. However, optical transmission through isolated subwavelength apertures is very low in the lithography process. It also makes it difficult to obtain a uniform lithography pattern where isolated and arrayed slit structures coexist because of different optical transmission through these two kinds of structures. It is proposed in this paper that using appropriately designed groove structures around subwavelength metallic slits could solve this problem. Numerical calculations performed by the finite-difference time-domain (FDTD) method demonstrate that about ten times transmission enhancement could be obtained. This occurs as a surface plasmon is resonantly excited and light is concentrated into nanometer scale apertures, resulting in not only greatly enhanced NFL efficiency but also uniform distribution of light intensity for isolated and arrayed slit patterns. Also discussed is the enhancement dependence on the structural parameters of NFL masks.


PACS

42.82.Cr Fabrication techniques; lithography, pattern transfer

81.16.Nd Nanolithography

02.70.Bf Finite-difference methods

Subjects

Computational physics

Optics, quantum optics and lasers

Nanoscale science and low-D systems

Dates

Issue 12 (December 2009)

Received 22 June 2009, accepted for publication 20 August 2009

Published 21 September 2009



  1. Improved near field lithography by surface plasmon resonance in groove-patterned masks

    Beibei Zeng et al 2009 J. Opt. A: Pure Appl. Opt. 11 125003

  2. Degradation of tetrachloromethane and tetrachloroethene by Ni/Fe bimetallic nanoparticles

    Y Y Huang et al 2009 J. Phys.: Conf. Ser. 188 012014

  3. On properties of the Ising model for complex energy/temperature and magnetic field

    Victor Matveev and Robert Shrock 2008 J. Phys. A: Math. Theor. 41 135002

  4. Critical strain region evaluation of self-assembled semiconductor quantum dots

    D L Sales et al 2007 Nanotechnology 18 475503

  5. Bose–Einstein condensation of strongly correlated electrons and phonons in cuprate superconductors

    A S Alexandrov 2007 J. Phys.: Condens. Matter 19 125216

  6. Fidelity approach to quantum phase transitions: finite-size scaling for the quantum Ising model in a transverse field

    Huan-Qiang Zhou et al 2008 J. Phys. A: Math. Theor. 41 492002

  7. Deviation from bulk behaviour in the cold crystallization kinetics of ultrathin films of poly(3-hydroxybutyrate)

    S Napolitano and M Wübbenhorst 2007 J. Phys.: Condens. Matter 19 205121

  8. Angular and field properties of the critical current and melting line of Co-doped SrFe2As2 epitaxial films

    B Maiorov et al 2009 Supercond. Sci. Technol. 22 125011

  9. Anisotropic generalization of Stinchcombe's solution for the conductivity of random resistor networks on a Bethe lattice

    F Semeriyanov et al 2009 J. Phys. A: Math. Theor. 42 465001

  10. Dynamic investigation of mode transition in inductively coupled plasma with a hybrid model

    Shu-Xia Zhao et al 2009 J. Phys. D: Appl. Phys. 42 225203

Related review articles

What's this?
View review articles related to this research to gain an insight into the key trends in this subject area. Related review articles are selected based on PACS/MSC codes, and are no more than three years old.

  1. Material design and structural color inspired by biomimetic approach
  2. Physical processes in EUV sources for microlithography
  3. Multiphoton polymerization of hybrid materials
More

View by subject




Export








Please login to access our web services, or create an account if you don't yet have one.

You must have cookies enabled in your web browser to be able to login.

Username
Password

Forgotten your password? Get a new one here.