S Hofmann et al 2003 New J. Phys. 5 153 doi:10.1088/1367-2630/5/1/153
Controlled low-temperature growth of carbon nanofibres by plasma deposition
Focus on Carbon NanotubesS Hofmann, B Kleinsorge, C Ducati and J Robertson
Show affiliationsPart of Focus on Carbon Nanotubes
Vertically aligned carbon nanofibres were grown at temperatures as low as 120°C by plasma-enhanced chemical vapour deposition (PECVD). A systematic study of the temperature dependence of the growth rate found an activation energy of 0.23 eV, much less than that for thermal chemical vapour deposition (1.2–1.5 eV). This suggests that growth occurs by surface diffusion of carbon on nickel. Vertically aligned carbon nanofibres were grown by PECVD on to flexible plastic substrates. We show that individual lines and dots of free-standing 20–50 nm diameter nanotubes can be grown on to chromium-covered polyimide foil. The scalable deposition method allows large-area coverage without damaging or bending the sensitive substrate material. Field-emission cathodes were made for the purpose of demonstration.
- PACS
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52.77.Dq Plasma-based ion implantation and deposition
81.07.-b Nanoscale materials and structures: fabrication and characterization
79.70.+q Field emission, ionization, evaporation, and desorption
68.35.Fx Diffusion; interface formation
81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)
- Subjects
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Condensed matter: electrical, magnetic and optical
Surfaces, interfaces and thin films
- Dates
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Issue 1 (November 2003)
Received 20 August 2003
Published 17 November 2003
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Controlled low-temperature growth of carbon nanofibres by plasma deposition
S Hofmann et al 2003 New J. Phys. 5 153
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