E Loginova et al 2009 New J. Phys. 11 063046 doi:10.1088/1367-2630/11/6/063046
E Loginova1, N C Bartelt1, P J Feibelman2 and K F McCarty1,3
Show affiliationsGraphene forms from a relatively dense, tightly bound C-adatom gas when elemental C is deposited on or segregates to the Ru(0001) surface. Nonlinearity of the graphene growth rate with C-adatom density suggests that growth proceeds by addition of C atom clusters to the graphene edge. The generality of this picture has now been studied by use of low-energy electron microscopy (LEEM) to observe graphene formation when Ru(0001) and Ir(111) surfaces are exposed to ethylene. The finding that graphene growth velocities and nucleation rates on Ru have precisely the same dependence on adatom concentration as for elemental C deposition implies that hydrocarbon decomposition only affects graphene growth through the rate of adatom formation. For ethylene, that rate decreases with increasing adatom concentration and graphene coverage. Initially, graphene growth on Ir(111) is like that on Ru: the growth velocity is the same nonlinear function of adatom concentration (albeit with much smaller equilibrium adatom concentrations, as we explain with DFT calculations of adatom formation energies). In the later stages of growth, graphene crystals that are rotated relative to the initial nuclei nucleate and grow. The rotated nuclei grow much faster. This difference suggests firstly, that the edge-orientation of the graphene sheets relative to the substrate plays an important role in the growth mechanism, and secondly, that attachment of the clusters to the graphene is the slowest step in cluster addition, rather than formation of clusters on the terraces.
81.05.Uw Carbon, diamond, graphite
71.20.Tx Fullerenes and related materials; intercalation compounds
71.15.Mb Density functional theory, local density approximation, gradient and other corrections
Condensed matter: electrical, magnetic and optical
Issue 6 (June 2009)
Received 2 April 2009
Published 24 June 2009
E Loginova et al 2009 New J. Phys. 11 063046
Stefan Legel et al 2008 New J. Phys. 10 045016
Julien Serreau JHEP05(2004)078
Allan Adams and Jarah Evslin JHEP02(2003)029
C R Quétel et al 2007 Metrologia 44 08010
Allan Adams et al JHEP10(2001)029
Joële Viallon et al 2006 Metrologia 43 08010
Y Aregbe and P D P Taylor 2006 Metrologia 43 08006
Gherardo Piacitelli JHEP08(2004)031
André D Bandrauk et al 2008 New J. Phys. 10 025004