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Deutsche Physikalische Gessellschaft IOP Institute of Physics

Charge dependence of nano-particle growth in silane plasmas under UV irradiation

C R Seon1,3, W Choe1,4, K B Chai1, H Y Park1 and S Park2

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The controlled generation of nano-particles has been an important issue for the nano-structure formation in processing plasmas. We observed that the particle growth under UV irradiation was enhanced due to electric charge reduction of the particles, suggesting that the variation of particle charges could be a control parameter for the particle growth. The particle growth variation by UV irradiation is well described by the particle coagulation model with time-dependent particle charges in consideration, where predator particles grow by adsorbing a few nanometer-sized proto-particles.


PACS

81.16.-c Methods of nanofabrication and processing

68.43.-h Chemisorption/physisorption: adsorbates on surfaces

61.80.Ba Ultraviolet, visible, and infrared radiation effects (including laser radiation)

61.82.Rx Nanocrystalline materials

52.77.-j Plasma applications

82.70.-y Disperse systems; complex fluids

Subjects

Soft matter, liquids and polymers

Surfaces, interfaces and thin films

Plasma physics

Condensed matter: structural, mechanical & thermal

Nanoscale science and low-D systems

Chemical physics and physical chemistry

Dates

Issue 1 (January 2009)

Received 27 September 2008

Published 7 January 2009



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