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Effect of annealing on photoluminescence and microstructures of InGaN/GaN multi-quantum well with Mg-doped p-type GaN

Li Zhong-Hui1,3,4, Yu Tong-Jun2, Yang Zhi-Jian2, Feng Yu-Chun1, Zhang Guo-Yi2, Guo Bao-Ping1 and Niu Han-Ben1

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InGaN/GaN multi-quantum well structure with Mg-doped p-type GaN was grown by low-pressure metalorganic vapour phase epitaxy. After rapid-thermal-annealing at 700 and 900 degrees C, both the red-shift and the blue-shift of the photoluminescence (PL) peak, the decreased and the enhancement of the PL intensity were observed. The transmission electron microscopic images showed that InGaN multi-quantum-dots-like (MQD-like) structures with dimensions less than 5×10nm were formed in InGaN wells. The changes of PL spectra could be tentatively attributed to the competition between the red-shift mechanism of the quantum-confined Stark effect and the blue-shift mechanism of the quantum size effect due to MQD-like structures.


PACS

78.55.Cr III-V semiconductors

78.67.De Quantum wells

81.15.Kk Vapor phase epitaxy; growth from vapor phase

81.40.Ef Cold working, work hardening; annealing, post-deformation annealing, quenching, tempering recovery, and crystallization

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Condensed matter: structural, mechanical & thermal

Nanoscale science and low-D systems

Dates

Issue 4 ( 1 April 2005)

Received 14 May 2004, in final form 17 December 2004



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