Ioannis Karafyllidis 1999 Modelling Simul. Mater. Sci. Eng. 7 157 doi:10.1088/0965-0393/7/2/002
Ioannis Karafyllidis
Show affiliationsCellular Automata have been extensively used as a two-dimensional simulator of the photoresist etching process. This simulator has been verified experimentally for 248 nm photolithography. In this work the Cellular Automata simulator is extended in three dimensions in order to deal with problems arising in 193 nm photolithography and beyond. The three-dimensional simulator is tested using well known etch-rate distribution functions and its results are compared with experimental results found in the literature.
85.40.Bh Computer-aided design of microcircuits; layout and modeling
Issue 2 (March 1999)
Received 20 August 1998, accepted for publication 5 January 1999
Ioannis Karafyllidis 1999 Modelling Simul. Mater. Sci. Eng. 7 157
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