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Modelling of electron and hole trapping in oxides

A L Shluger1,2, K P McKenna1,2, P V Sushko1,2, D Muñoz Ramo1,3 and A V Kimmel1,4

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We critically review several examples of successful modelling of electron and hole trapping in metal oxides, which demonstrate a breadth of polaronic behaviour. The examples range from self-trapping in the perfect lattice to trapping by structural defects and impurities and illustrate the important phenomenon of charge localization. We present recent results in four different systems: nanoporous mayenite, amorphous SiO2, crystalline hafnia and MgO surfaces and interfaces. The complex nature of charge trapping and polaronic behaviour in these systems can go beyond traditional cases and illustrate the different challenges involved.


PACS

71.38.Ht Self-trapped or small polarons

72.20.Jv Charge carriers: generation, recombination, lifetime, and trapping

73.20.Hb Impurity and defect levels; energy states of adsorbed species

71.55.Ht Other nonmetals

72.80.Sk Insulators

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Dates

Issue 8 (December 2009)

Received 6 July 2009, in final form 12 October 2009

Published 23 November 2009



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