For your convenience the contents are listed here in order of low to high pressure.

PAPERS

Characterization of a modular broad beam ion source(252-267)
M Zeuner, H Neumann, F Scholze, D Flamm, M Tartz and F Bigl

Enhanced diffusion and isotope extraction driven by ion-cyclotron surface waves in a rippled magnetic field(410-415)
A G Elfimov, R M O Galvão and I C Nascimento

Evolution of ion and electron energy distributions in pulsed helicon plasma discharges(337-347)
G D Conway, A J Perry and R W Boswell

Comparative study of silane radical composition in continuous and pulsed electron cyclotron resonance discharges(323-329)
Y Yasaka and K Nishimura

Enhanced deposition rates in plasma sputter deposition(245-251)
A L Thomann, C Charles, P Brault, C Laure and R Boswell

Neutral pumping in a helicon discharge(416-422)
J Gilland, R Breun and N Hershkowitz

Fast modelling of low-pressure radio-frequency collisional capacitively coupled discharge and investigation of the formation of a non-Maxwellian electron distribution function(268-281)
S V Berezhnoi, I D Kaganovich and L D Tsendin

Two-dimensional modelling of SiH--H radio-frequency discharges for a-Si:H deposition(348-358)
O Leroy, G Gousset, L Lemos Alves, J Perrin and J Jolly

A comparative study of the electron distribution function in the positive columns in N and N/He dc glow discharges by optical spectroscopy and probes(298-309)
N K Bibinov, D B Kokh, N B Kolokolov, V A Kostenko, D Meyer, I P Vinogradov and K Wiesemann

Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy(423-430)
J-P Booth, G Cunge, F Neuilly and N Sadeghi

A coupled two-sheath simulation of RF bias at high electronegativities(289-297)
S K Kanakasabapathy and L J Overzet

Self-consistent kinetic model of low-pressure N--H flowing discharges: I. Volume processes(363-378)
B Gordiets, C M Ferreira, M J Pinheiro and A Ricard

Self-consistent kinetic model of low-pressure N--H flowing discharges: II. Surface processes and densities of N, H, NH species(379-388)
B Gordiets, C M Ferreira, M J Pinheiro and A Ricard

On the hollow-cathode effect: conventional and modified geometry(310-322)
R R Arslanbekov, A A Kudryavtsev and R C Tobin

Diode laser absorption measurements of metastable helium in glow discharges(389-394)
M W Millard, P P Yaney, B N Ganguly and C A DeJoseph Jr

Pumping of highly vibrationally excited molecules in a hydrogen flow through a cesium--hydrogen discharge(431-439)
F G Baksht, V G Ivanov and M Bacal

Experimental studies of HAr plasma in a planar inductive discharge(330-336)
J T Gudmundsson

Ionization efficiency in a geometrically pinched cascaded arc(395-409)
K T A L Burm, W J Goedheer, J A M van der Mullen, G M Janssen and D C Schram

Rate coefficients under jet conditions(359-362)
E Garcíi a and A Laganà

Etching materials with an atmospheric-pressure plasma jet(282-285)
J Y Jeong, S E Babayan, V J Tu, J Park, I Henins, R F Hicks and G S Selwyn

Deposition of silicon dioxide films with an atmospheric-pressure plasma jet(286-288)
S E Babayan, J Y Jeong, V J Tu, J Park, G S Selwyn and R F Hicks