Jeroen Jonkers 2006 Plasma Sources Sci. Technol. 15 S8 doi:10.1088/0963-0252/15/2/S02
Jeroen Jonkers
Show affiliationsExtreme ultra-violet (EUV) lithography is most likely to be used for the production of semiconductors from 2009. One of the potential showstoppers in the commercialization is the availability of a compact high power source. This paper discusses the latest developments on the different kinds of plasma-based EUV sources. The progress of laser-produced plasmas seems to be limited as they are roughly at the same level as in 2000. In the field of gas discharges and vacuum arcs, a huge improvement in output power and in lifetime has been made recently. Vacuum arcs, especially, seem to offer the possibility of meeting the specifications for high-volume manufacturing.
42.72.Bj Visible and ultraviolet sources
42.82.Cr Fabrication techniques; lithography, pattern transfer
52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
Issue 2 (May 2006)
Received 8 August 2005
Published 24 April 2006
Jeroen Jonkers 2006 Plasma Sources Sci. Technol. 15 S8
Florian Baumann et al 2006 J. Phys. A: Math. Gen. 39 4095