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High power extreme ultra-violet (EUV) light sources for future lithography

Jeroen Jonkers

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Extreme ultra-violet (EUV) lithography is most likely to be used for the production of semiconductors from 2009. One of the potential showstoppers in the commercialization is the availability of a compact high power source. This paper discusses the latest developments on the different kinds of plasma-based EUV sources. The progress of laser-produced plasmas seems to be limited as they are roughly at the same level as in 2000. In the field of gas discharges and vacuum arcs, a huge improvement in output power and in lifetime has been made recently. Vacuum arcs, especially, seem to offer the possibility of meeting the specifications for high-volume manufacturing.


Footnote
*  Philips Extreme UV GmbH is a joint venture between Philips Lighting and the Fraunhofer Institute for Laser Technology (ILT).
PACS

42.72.Bj Visible and ultraviolet sources

52.80.Vp Discharge in vacuum

42.82.Cr Fabrication techniques; lithography, pattern transfer

52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)

52.50.Dg Plasma sources

Subjects

Optics, quantum optics and lasers

Plasma physics

Dates

Issue 2 (May 2006)

Received 8 August 2005

Published 24 April 2006



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