K H Bai et al 2004 Plasma Sources Sci. Technol. 13 662 doi:10.1088/0963-0252/13/4/015
K H Bai1, C K Choi2 and H Y Chang1
Show affiliationsThe electron temperature is controlled to 0.6 eV with a small mesh number (the number of the grid wire per 2.54 cm) grid in Ar 1.3 Pa inductively coupled plasma. The key factor in determining the electron temperature is different for different mesh numbers: when the mesh number is large, the key factor is the potential difference between the plasma potential in region II and the grid bias voltage, but when the mesh number is small the plasma potential difference between regions I and II is the key factor. Furthermore, in such cases, the electron density in region II increases with discharge pressure, which is the opposite of what occurs when the mesh number is large. The measured electron energy probability functions show a bump structure for some conditions. This could be explained by the low electron–electron or electron–neutral collision frequencies due to the low electron density and operating pressure.
Issue 4 (November 2004)
Received 14 May 2003
Published 12 October 2004
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