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Plasma Sources Science and Technology Volume 13 Number 4 Create an alert RSS this journal

V I Demidov et al 2004 Plasma Sources Sci. Technol. 13 600 doi:10.1088/0963-0252/13/4/008

Ionization kinetics and E–H mode transition in a noble gas, low-pressure pulsed ICP discharge*

V I Demidov1, C A DeJoseph Jr2 and A A Kudryavtsev3

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Abstract References Cited By

Under some conditions of power modulation, an rf ICP will exhibit a rapid transition between E and H modes following application of the rf power. It is shown that in noble gases this transition may be connected with the dynamics of the electron density and metastable density of the atoms, and competition between direct and stepwise ionization of the atoms by electron impact. A simple model allows us to demonstrate that after application of rf power the initial slow growth of electron density changes to a rapidly rising function. This rapid rise is consistent with observed E–H transitions that take place in these discharges. The model thus allows us to calculate the characteristic time for the transition beteween modes.


Footnote
*  This paper is declared a work of the US Government and is not subject to copyright protection in the United States.
PACS

52.80.Pi High-frequency and RF discharges

52.25.Jm Ionization of plasmas

52.40.Db Electromagnetic (nonlaser) radiation interactions with plasma

52.25.Dg Plasma kinetic equations

Subjects

Plasma physics

Dates

Issue 4 (November 2004)

Received 19 April 2004

Published 17 September 2004



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