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YAG laser-assisted etching of silicon for fabricating sensors and actuators

K Minami, Y Wakabayashi, M Yoshida, K Watanabe and M Esashi

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YAG laser-assisted etching techniques were developed and investigated for realising silicon microstructures. Gases, including HCl, SF6 and NF3 were used for silicon etching. These produce volatile exhaust at atmospheric pressure. YAG laser-assisted etching was applied to fabricate an electrostatic microactuator, resonating sensors and accelerometers. This resistless dry etching can be applied to three-dimensional microstructures.


PACS

85.85.+j Micro- and nano-electromechanical systems (MEMS/NEMS) and devices

07.07.Tw Servo and control equipment; robots

81.65.Cf Surface cleaning, etching, patterning

07.07.Df Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing

Subjects

Electronics and devices

Instrumentation and measurement

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Dates

Issue 2 (June 1993)



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