K Minami et al 1993 J. Micromech. Microeng. 3 81 doi:10.1088/0960-1317/3/2/008
K Minami, Y Wakabayashi, M Yoshida, K Watanabe and M Esashi
Show affiliationsYAG laser-assisted etching techniques were developed and investigated for realising silicon microstructures. Gases, including HCl, SF6 and NF3 were used for silicon etching. These produce volatile exhaust at atmospheric pressure. YAG laser-assisted etching was applied to fabricate an electrostatic microactuator, resonating sensors and accelerometers. This resistless dry etching can be applied to three-dimensional microstructures.
85.85.+j Micro- and nano-electromechanical systems (MEMS/NEMS) and devices
07.07.Tw Servo and control equipment; robots
81.65.Cf Surface cleaning, etching, patterning
07.07.Df Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing
Instrumentation and measurement
Issue 2 (June 1993)
K Minami et al 1993 J. Micromech. Microeng. 3 81
G Brida et al 2000 Metrologia 37 629
Bethany Jochim et al 2009 J. Phys. B: At. Mol. Opt. Phys. 42 091002
Michael R. Ramage and Graham G. Ross JHEP08(2005)031
J Harder et al 2000 Metrologia 37 415
Yutaka Nomura et al 2007 New J. Phys. 9 9
V M Svistunov and A I D'yachenko 1992 Supercond. Sci. Technol. 5 98
X Chen et al 1997 Distrib. Syst. Engng. 4 229
M A Wanas 1976 J. Phys. D: Appl. Phys. 9 811
HongSheng Zhao and Bo Qin 2003 ApJ 582 2