Jiseok Lim and Shinill Kang 2009 J. Micromech. Microeng. 19 125001 doi:10.1088/0960-1317/19/12/125001
Jiseok Lim and Shinill Kang1
Show affiliationsA direct patterning process which uses imprinting and sintering of metal nano-powder to make conductive tracks where sintering was performed during imprinting process was designed. A silicon mold for making conductive tracks was designed and fabricated using photolithography and reactive ion etching (RIE). The effect of process conditions on pattern formation was investigated experimentally. To confirm the feasibility of the direct patterning method as an industrial process, the microstructure and electrical resistivity of the fabricated conductive tracks were analyzed. Various defects were analyzed and based on the analysis, the histories of temperature and pressure were optimized.
81.16.Rf Nanoscale pattern formation
61.43.Gt Powders, porous materials
73.63.-b Electronic transport in nanoscale materials and structures
Surfaces, interfaces and thin films
Issue 12 (December 2009)
Received 22 May 2009
Published 20 October 2009
Jiseok Lim and Shinill Kang 2009 J. Micromech. Microeng. 19 125001
C E Patton and Yi-hua Liu 1983 J. Phys. C: Solid State Phys. 16 5995
R Frahm et al 2009 J. Phys.: Conf. Ser. 190 012040
Calvin Stubbins et al 2004 J. Phys. B: At. Mol. Opt. Phys. 37 2201
N R Badnell 1999 J. Phys. B: At. Mol. Opt. Phys. 32 5583
D C Comsa et al 2006 Phys. Med. Biol. 51 3733
Rocky Kolb 2007 Rep. Prog. Phys. 70 1583
Manuel O Cáceres and G Liliana Insua 2005 J. Phys. A: Math. Gen. 38 3711
Tomoaki Nogawa and Takehisa Hasegawa 2009 J. Phys. A: Math. Theor. 42 478002
Gary D. Schmidt et al. 2001 ApJ 553 823