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Simulation and fabrication of SiO2-based piezoresistive microbridges for chem/biosensors

Yanqing Lu, Venkata Chivukula, Ming Wang and Hai-Feng Ji

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This paper uses finite element design for optimization of piezoresistive silicon covered SiO2 microbridges. Resistance changes of the microbridge due to the surface stress changes were systematically investigated by varying Si piezoresistor geometries and the boron doping concentrations in silicon. Our simulation results show that the resistance change of the microbridge is directly related to the arcuation of the microbridges and a better ΔR/R response can be obtained with a thinner and narrower silicon piezoresistor. However, the S/N ratio was not significantly affected by the SiO2 dimensions. A fabrication process of silicon covered SiO2 microbridges is also reported.


PACS

85.30.De Semiconductor-device characterization, design, and modeling

85.85.+j Micro- and nano-electromechanical systems (MEMS/NEMS) and devices

07.07.Df Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing

Subjects

Electronics and devices

Instrumentation and measurement

Semiconductors

Nanoscale science and low-D systems

Dates

Issue 4 (April 2006)

Received 1 November 2005, in final form 11 December 2005

Published 6 March 2006



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