Ampere A Tseng 2004 J. Micromech. Microeng. 14 R15 doi:10.1088/0960-1317/14/4/R01
Ampere A Tseng
Show affiliationsThe application of focused ion beam (FIB) technology in microfabrication has become increasingly popular. Its use in microfabrication has advantages over contemporary photolithography or other micromachining technologies, such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. An overview of the recent development in FIB microfabrication technology is given. The emphasis will be on direct milling, or maskless techniques, and this can distinguish the FIB technology from the contemporary photolithography process and provide a vital alternative to it. After an introduction to the technology and its FIB principles, the recent developments in using milling techniques for making various high-quality devices and high-precision components at the micrometer scale are examined and discussed. Finally, conclusions are presented to summarize the reviewed work and to suggest the areas for improving the FIB milling technology and for future research.
85.85.+j Micro- and nano-electromechanical systems (MEMS/NEMS) and devices
42.82.Cr Fabrication techniques; lithography, pattern transfer
Optics, quantum optics and lasers
Issue 4 (April 2004)
Received 10 June 2003
Published 19 January 2004
Ampere A Tseng 2004 J. Micromech. Microeng. 14 R15
L Wu et al 2003 Supercond. Sci. Technol. 16 1127
John A. R. Caldwell et al. 2008 ApJS 174 136
Alex B Nielsen and Matt Visser 2006 Class. Quantum Grav. 23 4637
Alan J Bray and Richard Smith 2007 J. Phys. A: Math. Theor. 40 10965
R Mohan Sankaran and K P Giapis 2003 J. Phys. D: Appl. Phys. 36 2914
Emad M AboEldahab 2000 J. Phys. D: Appl. Phys. 33 3180
M. Selwa et al 2007 ApJ 668 L83
Mark Srednicki and Frank Stiernelof 1996 J. Phys. A: Math. Gen. 29 5817
T B Jones et al 2009 J. Phys. D: Appl. Phys. 42 225505