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Silicon nitride ceramic-based two-dimensional microcombustor

Shuji Tanaka1, Takashi Yamada1, Shinya Sugimoto1, Jing-Feng Li2,4 and Masayoshi Esashi3

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In this paper we describe silicon nitride (Si3N4) ceramic-based microdiffusion combustors with a two-dimensional structure, which is potentially batch-producible by microelectromechanical systems machining technology such as deep reactive ion etching. Si3N4 ceramic structures were fabricated by the nitridation of a spark-plasma-sintered silicon green compact after mechanical micromilling. Five types of combustor with a combustion chamber volume of 181 μl and depths of 1, 2 and 3 mm were tested. The combustors with combustion chamber depths of 2 or 3 mm achieved stable combustion at equivalence ratios from 0.28 to 1.3 and total flow rates from 4.0 to 11.3 SLM. They formed a flame at the center of the combustion chamber as designed, when the equivalence ratio was low. However, the combustor with a combustion chamber depth of 1 mm could not maintain a flame in the combustion chamber. This may be because combustion was not completed due to the shallow combustion chamber with a depth equivalent to the quenching distance of hydrogen.


PACS

81.20.Wk Machining, milling

85.85.+j Micro- and nano-electromechanical systems (MEMS/NEMS) and devices

82.33.Vx Reactions in flames, combustion, and explosions

81.05.Je Ceramics and refractories (including borides, carbides, hydrides, nitrides, oxides, and silicides)

81.65.Cf Surface cleaning, etching, patterning

Subjects

Electronics and devices

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Condensed matter: structural, mechanical & thermal

Chemical physics and physical chemistry

Dates

Issue 3 (May 2003)

Received 12 December 2002, in final form 12 March 2003

Published 15 April 2003



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