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Device performance of ferroelectric/correlated oxide heterostructures for non-volatile memory applications

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Published 16 May 2011 IOP Publishing Ltd
, , Citation J Hoffman et al 2011 Nanotechnology 22 254014 DOI 10.1088/0957-4484/22/25/254014

0957-4484/22/25/254014

Abstract

Ferroelectric field effect devices offer the possibility of non-volatile data storage. Attempts to integrate perovskite ferroelectric materials with silicon semiconductors, however, have been largely unsuccessful in creating non-volatile, nondestructive read memory elements because of difficulties in controlling the ferroelectric/semiconductor interface. Correlated oxide systems have been explored as alternative channel materials to form all-perovskite field effect devices. We examine a non-volatile memory using an electric-field-induced metal–insulator transition in PbZr0.2Ti0.8O3/La1 − xSrxMnO3 (PZT/LSMO), PZT/La1 − xCaxMnO3 (PZT/LCMO) and PZT/La1 − xSrxCoO3 (PZT/LSCO) devices. The performance of these devices in the areas of switching time and retention are discussed.

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10.1088/0957-4484/22/25/254014