Daniel J Burbridge et al 2010 Nanotechnology 21 045302 doi:10.1088/0957-4484/21/4/045302
Daniel J Burbridge1, Simon Crampin1, Guillaume Viau2 and Sergey N Gordeev1
Show affiliationsThe use of spot-exposure electron-beam-induced deposition (EBID) to immobilize targeted nanoparticles on a substrate is demonstrated, and investigated using experiment and simulation. Nanoparticles are secured in place through the build-up of carbonaceous material that forms in the region between a particle and substrate when an energetic electron beam is focused onto the particle and projected through to the substrate. Material build-up directly affects the strength of adhesion to the surface, and can be controlled through electron dosage and beam energy. By selectively immobilizing specific particles within surface agglomerations and removing the excess, we illustrate the potential for spot-exposure EBID as a new technique for nanofabrication.
81.16.-c Methods of nanofabrication and processing
81.07.-b Nanoscale materials and structures: fabrication and characterization
Issue 4 (29 January 2010)
Received 2 September 2009, in final form 27 November 2009
Published 10 December 2009
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