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The oxidation of metal-capped Co cluster films under ambient conditions

J A De Toro1, J P Andrés, J A González, P Muñiz and J M Riveiro

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We report on the unexpected deterioration under ambient conditions of films of Co clusters capped with relatively thick (>100 nm) Cu (or Ti) layers deposited by either thermal evaporation or by radiofrequency sputtering. The magnetic character of the clusters, prepared by gas-phase condensation, allows monitoring the oxidation of the samples through the decay of the saturation magnetization, which takes place on a timescale of days. By contrast, diluted (<10 at.%) cluster-assembled granular Co:Cu films, prepared by co-deposition of the Co clusters with a Cu vapour, are perfectly stable under ambient conditions. We tentatively explain the oxidation of the cluster films as stemming from their very high porosity.


PACS

75.75.+a Magnetic properties of nanostructures

75.50.Tt Fine-particle systems; nanocrystalline materials

75.60.Ej Magnetization curves, hysteresis, Barkhausen and related effects

75.30.Cr Saturation moments and magnetic susceptibilities

Subjects

Condensed matter: electrical, magnetic and optical

Nanoscale science and low-D systems

Dates

Issue 8 (25 February 2009)

Received 29 October 2008, in final form 19 December 2008

Published 3 February 2009



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