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InSb heterostructure nanowires: MOVPE growth under extreme lattice mismatch

Philippe Caroff1, Maria E Messing, B Mattias Borg, Kimberly A Dick, Knut Deppert and Lars-Erik Wernersson

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We demonstrate the growth of InSb-based nanowire heterostructures by metalorganic vapour phase epitaxy and use it to integrate InSb on extremely lattice-mismatched III–V nanowire templates made of InAs, InP, and GaAs. Influence of temperature, V/III ratio, and diameter are investigated in order to investigate the growth rate and morphology. The range of growth temperatures used for InSb nanowire growth is very similar to that used for planar growth due to the nature of the precursor decomposition. This makes optimization of growth parameters very important, and more difficult than for most other nanowire III–V materials. Analysis of the InSb nanowire epitaxial quality when grown on InAs, InP, and GaAs, along with InSb segment and particle compositions are reported. This successful direct integration of InSb nanowires, on nanowire templates with unprecedented strain levels show great promise for fabrication of vertical InSb devices.


PACS

81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

68.65.La Quantum wires (patterned in quantum wells)

81.15.Kk Vapor phase epitaxy; growth from vapor phase

68.37.Hk Scanning electron microscopy (SEM) (including EBIC)

73.40.Kp III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions

81.07.Vb Quantum wires

Subjects

Semiconductors

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Dates

Issue 49 (9 December 2009)

Received 11 May 2009, in final form 16 October 2009

Published 11 November 2009



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