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Self-assembled ferrofluid lithography: patterning micro and nanostructures by controlling magnetic nanoparticles

Chih-Hao Chang1,2,4, Chee-Wee Tan1,3, Jianmin Miao3 and George Barbastathis1,2

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We have developed an alternative self-assembly process to pattern different geometries with user-defined tunability across the micro and nanoscale. In this approach, field-induced assembly of colloidal magnetic nanoparticles within a microfluidic channel is used as a tunable mask for near-field lithography. We have fabricated dot arrays with controllable spacing and micro-ring patterns with 250 nm feature sizes. The proposed process is versatile, cost-effective, and scalable, presenting itself as a promising nanomanufacturing tool.


PACS

81.16.Nd Nanolithography

81.16.Rf Nanoscale pattern formation

75.50.Mm Magnetic liquids

75.50.Tt Fine-particle systems; nanocrystalline materials

82.70.Dd Colloids

81.16.Dn Self-assembly

Subjects

Soft matter, liquids and polymers

Nanoscale science and low-D systems

Chemical physics and physical chemistry

Dates

Issue 49 (9 December 2009)

Received 23 September 2009, in final form 26 October 2009

Published 6 November 2009



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