Chih-Hao Chang et al 2009 Nanotechnology 20 495301 doi:10.1088/0957-4484/20/49/495301
Chih-Hao Chang1,2,4, Chee-Wee Tan1,3, Jianmin Miao3 and George Barbastathis1,2
Show affiliationsWe have developed an alternative self-assembly process to pattern different geometries with user-defined tunability across the micro and nanoscale. In this approach, field-induced assembly of colloidal magnetic nanoparticles within a microfluidic channel is used as a tunable mask for near-field lithography. We have fabricated dot arrays with controllable spacing and micro-ring patterns with 250 nm feature sizes. The proposed process is versatile, cost-effective, and scalable, presenting itself as a promising nanomanufacturing tool.
81.16.Rf Nanoscale pattern formation
Soft matter, liquids and polymers
Issue 49 (9 December 2009)
Received 23 September 2009, in final form 26 October 2009
Published 6 November 2009
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