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Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography

Ana-Maria Popa1,2,3, Philippe Niedermann1, Harry Heinzelmann1, Jeffrey A Hubbell2 and Raphaël Pugin1

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Here we show a method for patterning a thin metal film using self-assembled block-copolymer micelles monolayers as a template. The obtained metallic mask is transferred by reactive ion etching in silicon oxide, silicon and silicon nitride substrates, thus fabricating arrays of hexagonally packed nanopores with tunable diameters, interspacing and aspect ratios. This technology is compatible with integration into a standard microtechnology sequence for wafer-scale fabrication of ultrathin silicon nitride nanoporous membranes with 80 nm mean pore diameter.


PACS

81.16.Nd Nanolithography

81.16.Rf Nanoscale pattern formation

81.65.Cf Surface cleaning, etching, patterning

81.05.Rm Porous materials; granular materials

81.07.-b Nanoscale materials and structures: fabrication and characterization

82.70.Dd Colloids

Subjects

Soft matter, liquids and polymers

Surfaces, interfaces and thin films

Condensed matter: structural, mechanical & thermal

Nanoscale science and low-D systems

Chemical physics and physical chemistry

Dates

Issue 48 (2 December 2009)

Received 14 August 2009, in final form 28 September 2009

Published 30 October 2009



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