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Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography

Ana-Maria Popa1,2,3, Philippe Niedermann1, Harry Heinzelmann1, Jeffrey A Hubbell2 and Raphaël Pugin1

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Here we show a method for patterning a thin metal film using self-assembled block-copolymer micelles monolayers as a template. The obtained metallic mask is transferred by reactive ion etching in silicon oxide, silicon and silicon nitride substrates, thus fabricating arrays of hexagonally packed nanopores with tunable diameters, interspacing and aspect ratios. This technology is compatible with integration into a standard microtechnology sequence for wafer-scale fabrication of ultrathin silicon nitride nanoporous membranes with 80 nm mean pore diameter.


PACS

81.16.Nd Nanolithography

81.16.Rf Nanoscale pattern formation

81.65.Cf Surface cleaning, etching, patterning

81.05.Rm Porous materials; granular materials

81.07.-b Nanoscale materials and structures: fabrication and characterization

82.70.Dd Colloids

Subjects

Soft matter, liquids and polymers

Surfaces, interfaces and thin films

Condensed matter: structural, mechanical & thermal

Nanoscale science and low-D systems

Chemical physics and physical chemistry

Dates

Issue 48 (2 December 2009)

Received 14 August 2009, in final form 28 September 2009

Published 30 October 2009



  1. Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography

    Ana-Maria Popa et al 2009 Nanotechnology 20 485303

  2. Growth temperature dependence on local structures of Fe0.05Si0.95 diluted magnetic semiconductors studied by X-ray absorption near-edge structure

    Yong Jiang et al 2009 J. Phys.: Conf. Ser. 190 012106

  3. The partition function in the Wigner–Kirkwood expansion

    Sergei G Matinyan and Berndt Müller 2006 J. Phys. A: Math. Gen. 39 L285

  4. Method of approximate treatment of the relativistic compound free-free matrix elements

    T A Fedorova et al 2000 J. Phys. B: At. Mol. Opt. Phys. 33 5007

  5. Highlighting the angular dependence of bond softening and bond hardening of H+2 in an ultrashort intense laser pulse

    P Q Wang et al 2005 J. Phys. B: At. Mol. Opt. Phys. 38 L251

  6. Reaction Rate Uncertainties and the Production of 19F in Asymptotic Giant Branch Stars

    Maria Lugaro et al. 2004 ApJ 615 934

  7. Effect of process conditions on the properties of conductive tracks in direct imprinting and sintering of metal nano-powders

    Jiseok Lim and Shinill Kang 2009 J. Micromech. Microeng. 19 125001

  8. Localised canting models for substituted magnetic oxides

    C E Patton and Yi-hua Liu 1983 J. Phys. C: Solid State Phys. 16 5995

  9. XAS at the materials science X-ray beamline BL8 at the DELTA storage ring

    R Frahm et al 2009 J. Phys.: Conf. Ser. 190 012040

  10. Low-lying energy levels of the hydrogen atom in a strong magnetic field

    Calvin Stubbins et al 2004 J. Phys. B: At. Mol. Opt. Phys. 37 2201

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