Ana-Maria Popa et al 2009 Nanotechnology 20 485303 doi:10.1088/0957-4484/20/48/485303
Ana-Maria Popa1,2,3, Philippe Niedermann1, Harry Heinzelmann1, Jeffrey A Hubbell2 and Raphaël Pugin1
Show affiliationsHere we show a method for patterning a thin metal film using self-assembled block-copolymer micelles monolayers as a template. The obtained metallic mask is transferred by reactive ion etching in silicon oxide, silicon and silicon nitride substrates, thus fabricating arrays of hexagonally packed nanopores with tunable diameters, interspacing and aspect ratios. This technology is compatible with integration into a standard microtechnology sequence for wafer-scale fabrication of ultrathin silicon nitride nanoporous membranes with 80 nm mean pore diameter.
81.16.Rf Nanoscale pattern formation
81.65.Cf Surface cleaning, etching, patterning
81.05.Rm Porous materials; granular materials
81.07.-b Nanoscale materials and structures: fabrication and characterization
Soft matter, liquids and polymers
Surfaces, interfaces and thin films
Condensed matter: structural, mechanical & thermal
Issue 48 (2 December 2009)
Received 14 August 2009, in final form 28 September 2009
Published 30 October 2009
Ana-Maria Popa et al 2009 Nanotechnology 20 485303
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