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Inverted hemispherical mask colloidal lithography

Haixia Xu, Wenyuan Rao, Jun Meng, Yang Shen, Chongjun Jin1 and Xuehua Wang

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This paper presents a cost-effective nanofabrication method for forming large area and high coverage two-dimensional metal nanostructures on flat and curved surfaces. This method starts with a periodic array of hemispherical dimples on polystyrene (PS) film prepared by colloidal lithography with a sacrificial layer of polyacrylic acid (PAA) underneath. After the removal of PAA in water solution, the PS layer is turned over and attached to the substrate to be patterned. An inverted hemispherical mask is formed after oxygen plasma etching. As the holes at the bottom are much larger than those on the surface, the mask is especially suitable for a standard lift-off process. Based on this mask, metal nano-disk and pair-disk arrays, as well as two-dimensional nanostructures on a curved surface, have been fabricated. Optical measurement shows that a surface plasmon resonance exists in a periodic disk array. This method is valuable for the fabrication of a magnifying metamaterial hyperlens in order to eliminate the limitation of optical diffraction.


PACS

81.16.Nd Nanolithography

42.70.-a Optical materials

52.77.Bn Etching and cleaning

68.55.A- Nucleation and growth

81.65.Cf Surface cleaning, etching, patterning

78.68.+m Optical properties of surfaces

Subjects

Surfaces, interfaces and thin films

Optics, quantum optics and lasers

Plasma physics

Nanoscale science and low-D systems

Dates

Issue 46 (18 November 2009)

Received 25 August 2009, in final form 24 September 2009

Published 22 October 2009



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