Eun-Uk Kim et al 2009 Nanotechnology 20 355302 doi:10.1088/0957-4484/20/35/355302
Eun-Uk Kim1, Kang-Jun Baeg1,2, Yong-Young Noh3, Dong-Yu Kim1,2, Takhee Lee1, Inkyu Park4,5 and Gun-Young Jung1,5
Show affiliationsWe have developed a new method that combines nanoimprint lithography and metal nanoparticle solution processing for fabricating metal nanowires. A polymer template with nanoscale features, fabricated by nanoimprint lithography, provided physical reservoirs which were filled with a silver nanoparticle solution during the spin-coating. After the lift-off process, the defined silver nanoparticle patterns were annealed to enhance the conductivity for use as electrodes. Silver nanowire patterns (500 nm linewidth with a 300 nm gap) were fabricated without using an expensive high-vacuum system for metal deposition. This method demonstrated pattern resolution enhancement compared with ink-jet printing which inherently suffers from ink spreading on the substrate surface. By using this method, organic thin film transistors composed of the solution-processed silver source/drain electrodes with a channel length of 300 nm were fabricated and showed comparable behaviors to those with vacuum-deposited electrodes.
81.16.Rf Nanoscale pattern formation
81.07.-b Nanoscale materials and structures: fabrication and characterization
Issue 35 (2 September 2009)
Received 16 June 2009, in final form 20 July 2009
Published 11 August 2009
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