Qiangfei Xia and Stephen Y Chou 2008 Nanotechnology 19 455301 doi:10.1088/0957-4484/19/45/455301
Qiangfei Xia and Stephen Y Chou1
Show affiliationsSelf-perfection by liquefaction (SPEL) was used to fabricate nanoimprint molds with an array of sub-25 nm diameter pillars (200 nm period), resulting in nearly perfect cylindrical shape and smooth sidewalls. SPEL turned an array of irregularly shaped Cr polygons into an array of nearly perfect circular dots with small diameter. The Cr dot arrays were then transferred to SiO2 or Si pillar arrays by means of reactive ion etching to produce imprint molds. High-fidelity nanoimprint lithography using the pillar molds was also demonstrated.
81.16.Rf Nanoscale pattern formation
81.07.-b Nanoscale materials and structures: fabrication and characterization
Surfaces, interfaces and thin films
Issue 45 (12 November 2008)
Received 20 July 2008, in final form 2 September 2008
Published 8 October 2008
Qiangfei Xia and Stephen Y Chou 2008 Nanotechnology 19 455301
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