A Banerjee and H Grebel 2008 Nanotechnology 19 365303 doi:10.1088/0957-4484/19/36/365303
A Banerjee and H Grebel
Show affiliationsGraphene—a monolayer of graphite—has attracted vast interest recently owing to its perfect two-dimensional crystallographic nature and its potential use in a new generation of microelectronic devices. Yet, a deposition method, which results in a large coverage of monolayer thick graphite, is still lacking. By using a chemical mechanical polishing (CMP) method we were able to deposit stress-free graphene on solid and perforated substrates alike, achieving area coverage of hundreds of microns squared.
81.15.-z Methods of deposition of films and coatings; film growth and epitaxy
81.16.-c Methods of nanofabrication and processing
85.40.-e Microelectronics: LSI, VLSI, ULSI; integrated circuit fabrication technology
Issue 36 (10 September 2008)
Received 9 May 2008, in final form 18 June 2008
Published 25 July 2008
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