Ho-Cheol Kim et al 2008 Nanotechnology 19 235301 doi:10.1088/0957-4484/19/23/235301
Ho-Cheol Kim1, Charles T Rettner and Linnea Sundström
Show affiliationsThe evolution of the scaling of modern semiconductor devices is governed by the ability to create scalable high-resolution patterns on substrates. Since it is becoming increasingly difficult and expensive to extend to smaller dimensions using optical lithography, there is a great deal of interest in alternative patterning methods. The self-assembly of block copolymers in thin films, which provides periodic patterns of 10–50 nm length scales, has been recognized as a promising candidate for such patterning. To be practical, however, this approach must provide control over the orientation and lateral placement of the microdomains. We report here our discovery of the controlled alignment of the lamellar microdomains of a block copolymer containing hybrid material using topographic pre-patterns on substrates. We find that this hybrid material forms lamellae with a half-pitch of approximately 20 nm perpendicular to the lines of a surface corrugation.
Soft matter, liquids and polymers
Issue 23 (11 June 2008)
Received 10 March 2008, in final form 25 March 2008
Published 6 May 2008
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