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Rapid fabrication of nanoneedle arrays by ion sputtering

Yi-Zhong Huang1,4, David J H Cockayne1, Jausovec Ana-Vanessa2, Russell P Cowburn2, Shou-Guo Wang3 and Roger C C Ward3

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We report a novel method for rapidly fabricating ordered nanoneedles using an ion beam that cuts through the Fe/GaAs single thin layer or the Fe/MgO/Fe/GaAs multilayer producing a pillar pattern followed by raster-scanning normal to the patterned area. However, such ordered nanoneedles were not formed on the pure GaAs substrate surface without the thin Fe film coating, nor were nanoneedles formed on the GaAs substrate coated with a thin Cr epitaxial film, when this method was used. It has advantages over other methods, being simple, fast and well controlled for fabricating one-dimensional nanostructure arrays, leading to a range of applications such as high aspect ratio sharp tips for atomic force microscope/atom probes and consequent possible quantum confinement effects or arrays of nanostructures for field-optical/photoluminescence emission and data recording.


PACS

81.07.-b Nanoscale materials and structures: fabrication and characterization

78.67.-n Optical properties of low-dimensional, mesoscopic, and nanoscale materials and structures

81.16.-c Methods of nanofabrication and processing

78.55.-m Photoluminescence, properties and materials

Subjects

Condensed matter: electrical, magnetic and optical

Nanoscale science and low-D systems

Dates

Issue 1 (9 January 2008)

Received 21 September 2007, in final form 22 October 2007

Published 29 November 2007



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