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Thermal stability of nanostructurally stabilized zirconium oxide

Fereydoon Namavar1, Gonghua Wang2, Chin Li Cheung2,4, Renat F Sabirianov3, Xiao Cheng Zeng2, Wai Ning Mei3, Jaeil Bai2, Joseph R Brewer2, Hani Haider1 and Kevin L Garvin1

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Nanostructurally stabilized zirconium oxide (NSZ) hard transparent films were produced without chemical stabilizers by the ion beam assisted deposition technique (IBAD). A transmission electron microscopy study of the samples produced below 150 °C revealed that these films are composed of zirconium oxide (ZrO2) nanocrystallites of diameters 7.5 ± 2.3 nm. X-ray and selected-area electron diffraction studies suggested that the as-deposited films are consistent with cubic phase ZrO2. Rutherford backscattering spectroscopy (RBS) indicated the formation of stoichiometric ZrO2. The phase identity of these optically transparent NSZ films was in agreement with cubic ZrO2, as indicated by the matching elastic modulus values from the calculated results for pure cubic zirconium oxide and results of nanoindentation measurements. Upon annealing in air for 1 h, these NSZ films were found to retain most of their room temperature deposited cubic phase x-ray diffraction signature up to 850 °C. Size effect and vacancy stabilization mechanisms and the IBAD technique are discussed to explain the present results.


PACS

65.80.+n Thermal properties of small particles, nanocrystals, nanotubes

68.60.Dv Thermal stability; thermal effects

68.55.A- Nucleation and growth

62.25.-g Mechanical properties of nanoscale systems

81.16.-c Methods of nanofabrication and processing

68.60.Bs Mechanical and acoustical properties

Subjects

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Dates

Issue 41 (17 October 2007)

Received 29 May 2007, in final form 27 July 2007

Published 12 September 2007



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