Matthew S Johannes et al 2007 Nanotechnology 18 345304 doi:10.1088/0957-4484/18/34/345304
Matthew S Johannes1,2, Daniel G Cole2,3 and Robert L Clark1,2
Show affiliationsAtomic force microscope (AFM) based local anodic oxidation of metallic and semiconducting layers has emerged as a powerful tool for nanoscale fabrication. A unique nanoscale patterning technique has been created that couples computer aided design (CAD) with the lithographic capabilities of the AFM. Target nanostructures to be deposited on a silicon substrate are rendered as a three-dimensional model. Using AFM based local anodic oxidation on a silicon substrate, the features are duplicated at the nanoscale using voltage bias, probe speed, and humidity modulation, as prescribed by the model. The work presented herein highlights the advantages when three-dimensional modeling is linked with nanolithography; nanoscale features can be precisely replicated from a design plan.
81.07.-b Nanoscale materials and structures: fabrication and characterization
Issue 34 (29 August 2007)
Received 12 April 2007, in final form 10 June 2007
Published 27 July 2007
Matthew S Johannes et al 2007 Nanotechnology 18 345304
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