Stefano Pagliara et al 2007 Nanotechnology 18 175302 doi:10.1088/0957-4484/18/17/175302
Stefano Pagliara, Luana Persano, Andrea Camposeo, Roberto Cingolani and Dario Pisignano
Show affiliationsWe investigate the registration accuracy achievable by multilevel soft lithography. By a specifically designed soft lithography aligner, we obtain, for the average misalignment between two registered patterned organic layers, values decreasing from (4.96 ± 0.02) to (0.50 ± 0.01) µm upon increasing the Young's modulus of the stamp materials from 1.8 to 2600 MPa. This clearly identifies in the stamp distortions the main factor limiting the registration accuracy. The potentiality to achieve registration within 500 nm over areas of 50 × 50 µm2 is demonstrated, opening the way for soft lithographies with high overlay alignment accuracy.
81.16.Rf Nanoscale pattern formation
81.07.-b Nanoscale materials and structures: fabrication and characterization
Issue 17 (2 May 2007)
Received 16 January 2007, in final form 5 March 2007
Published 2 April 2007
Stefano Pagliara et al 2007 Nanotechnology 18 175302
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