D Navas et al 2007 Nanotechnology 18 165302 doi:10.1088/0957-4484/18/16/165302
D Navas1, O Sánchez1,4, A Asenjo1, M Jaafar1, J L Baldonedo2, M Vázquez1 and M Hernández-Vélez1,3
Show affiliationsFabrication of nanostructured TiN films by magnetron sputtering using nanoporous anodic alumina films (NAAF) as substrates is reported. These hard nanostructured films could be used for pre-patterning aluminium foils and to obtain nanoporous films replicating the starting NAAF over a wide range of pore diameters and spacings. Pre-patterned Al foils are obtained by compression with pressures lower than those previously reported, then a new NAAF can be fabricated by means of only one anodization process. As an example, one of the TiN stamps was used for pre-patterning an Al foil at a pressure of 200 kg cm−2 and then it was anodized in oxalic acid solution obtaining the corresponding replica of the starting NAAF.
81.16.-c Methods of nanofabrication and processing
81.15.Cd Deposition by sputtering
68.37.Hk Scanning electron microscopy (SEM) (including EBIC)
81.07.-b Nanoscale materials and structures: fabrication and characterization
Issue 16 (25 April 2007)
Received 21 November 2006, in final form 2 February 2007
Published 23 March 2007
D Navas et al 2007 Nanotechnology 18 165302
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