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Local stabilization of single-walled carbon nanotubes on Si(100)-2 × 1:H via nanoscale hydrogen desorption with an ultrahigh vacuum scanning tunnelling microscope

Peter M Albrecht and Joseph W Lyding

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An ultrahigh vacuum scanning tunnelling microscope (UHV-STM) was used to modify the interface between isolated ≈10 Å-diameter single-walled carbon nanotubes (SWNTs) and the hydrogen-passivated Si(100) surface. Room-temperature UHV-STM desorption of hydrogen at the SWNT/H-Si(100) interface resulted in the local mechanical stabilization of tubes originally perturbed by the rastered STM tip under nominal imaging conditions. For the section of the SWNT contacted by depassivated Si, a topographic depression of 1.5 Å (1 Å) was measured in the case of parallel (nearly perpendicular) alignment between the tube axis and the Si dimer rows, in agreement with existing first-principles calculations. The compatibility of hydrogen-resist UHV-STM nanolithography with SWNTs adsorbed on H-Si(100) would enable the atomically precise placement of single molecules in proximity to the tube for the bottom-up fabrication of molecular electronic devices.


PACS

68.43.Mn Adsorption kinetics

68.37.Ef Scanning tunneling microscopy (including chemistry induced with STM)

68.35.Ct Interface structure and roughness

68.35.B- Structure of clean surfaces (and surface reconstruction)

Subjects

Surfaces, interfaces and thin films

Dates

Issue 12 (28 March 2007)

Received 8 January 2007, in final form 26 January 2007

Published 21 February 2007



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