Fengxiang Zhang and Hong Yee Low 2006 Nanotechnology 17 1884 doi:10.1088/0957-4484/17/8/013
Fengxiang Zhang and Hong Yee Low1
Show affiliationsThis paper describes a technique for the fabrication of ordered three-dimensional hierarchical nanostructures in polymer films via nanoimprint lithography. The hierarchical structure is obtained by a series of sequential imprinting steps, where smaller structures are imprinted on top of larger imprinted structures. Higher order hierarchy is achieved by sequentially adding imprinting steps. An important feature of this fabrication technique is that the subsequent imprinting is carried out at a temperature below the glass transition temperature of the polymer film and below the imprinting temperature of the preceding imprint without the assistance of any solvents or plasticizers. Various formats of hierarchical structures can be obtained by varying the mould geometries and mould orientations in the sequential imprinting. It is found that the secondary or higher-order imprints are enabled by a reduction in the modulus of the polymer after the primary imprinting.
68.55.-a Thin film structure and morphology
81.20.Hy Forming; molding, extrusion etc.
Surfaces, interfaces and thin films
Issue 8 (28 April 2006)
Received 16 November 2005, in final form 6 January 2006
Published 15 March 2006
Fengxiang Zhang and Hong Yee Low 2006 Nanotechnology 17 1884
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