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Controlled direct patterning of V2O5 nanowires onto SiO2 substrates by a microcontact printing technique

Yong-Kwan Kim1, Sung Joon Park1, Jae Pil Koo1, Dong-Jin Oh2, Gyu Tae Kim2, Seunghun Hong3 and Jeong Sook Ha1,4

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Vanadium pentoxide (V2O5) nanowires were directly transferred to desired patterns on SiO2 substrates using the microcontact printing (MCP) technique. The hydrophilicity of the poly(dimethylsiloxane) (PDMS) stamp exerted a strong influence on the mechanism of transfer of polar V2O5 nanowires onto the substrate. The V2O5 nanowires were transferred from the relief side of the hydrophilic stamp, whereas they were transferred from the recess edges of the hydrophobic one forming agglomerated nanowire patterns on the substrate. When the hydrophobic stamp was used, the width of the agglomerated nanowire patterns could be controlled by the concentration of the nanowire solution as well as by the width of the recess area of the PDMS stamp. This method allows us to generate nanowire patterns with a submicrometre line width, which is much smaller than a the few-micrometre sizes of PDMS stamp patterns. When the hydrophilic stamp with a small-sized (≤ the average length of V2O5 nanowires) pattern was used, alignment of individual nanowires in the direction of the boundary of the line pattern was obtained. These results suggest that the transfer mechanism in the MCP process strongly depends on the wetting interaction between the stamp and the nanowire ink.


PACS

81.16.Rf Nanoscale pattern formation

81.07.-b Nanoscale materials and structures: fabrication and characterization

81.16.Nd Nanolithography

Subjects

Nanoscale science and low-D systems

Dates

Issue 5 (14 March 2006)

Received 12 November 2005, in final form 12 January 2006

Published 10 February 2006



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