Wei-Lun Chang et al 2006 Nanotechnology 17 1333 doi:10.1088/0957-4484/17/5/027
Wei-Lun Chang, Shieh-Li Chou, You-Ren Chang and Pei-Kuen Wei1
Show affiliationsThis work presents a photomask lithography for mass manufacture of 100 nm photonic bandgap structures with designed defects. The photomask is composed of 300 nm thick dielectric rod arrays in order to generate edge diffracted beams. As the rod sizes are smaller than one wavelength, diffracted beams from the edges merge together and form subwavelength beaming arrays at rod regions. Theoretical calculations and optical near-field measurements verify the existence of subwavelength focused beams. Furthermore, the focused beams are not affected by the neighbouring defects in the near-field region. Using the transparent photomask, a simple laser exposure system and reactive dry etching method, we demonstrate the fabrication of subwavelength photonic bandgap structures with designed channel defects in a silicon substrate.
42.70.Qs Photonic bandgap materials
Surfaces, interfaces and thin films
Issue 5 (14 March 2006)
Received 9 November 2005, in final form 3 January 2006
Published 10 February 2006
Wei-Lun Chang et al 2006 Nanotechnology 17 1333
H George et al 2009 New J. Phys. 11 113028
J M Gerken and P R Dawson 2007 Modelling Simul. Mater. Sci. Eng. 15 799
Peter Pesic 1998 Eur. J. Phys. 19 151
Gao Hai-Yong et al 2008 Chinese Phys. Lett. 25 640
S Hamieh 2004 J. Phys. A: Math. Gen. 37 2777
N. Jarosik et al. 2003 ApJS 148 29
E Sh Botzvadze et al 1969 Phys. Med. Biol. 14 19
Gih Keong Lau and Hejun Du 2006 J. Micromech. Microeng. 16 1416
N Binsted and A Bryan Edwards 2009 J. Phys.: Conf. Ser. 190 012071