Xiaofeng Yu et al 2006 Nanotechnology 17 808 doi:10.1088/0957-4484/17/3/033
Xiaofeng Yu1,2, Yongxiang Li1, Wanyin Ge1,2, Qunbao Yang1, Nanfei Zhu1,2 and Kourosh Kalantar-zadeh3
Show affiliationsThe formation of nanoporous TiO2 by anodization of titanium films deposited on silicon substrates was investigated. Films with homogeneously distributed pores having an average pore diameter of 25 nm and interpore distance of 40 nm were obtained by anodization in an aqueous HF electrolyte solution after a comprehensive investigation of the anodization conditions. It was shown that the magnitude of the anodization current and voltage have significant roles in the formation of different surface morphologies with different pore dimensions, ranging from big pits to nanosize porous structures. The study showed that the nanoporous structure is formed only in 0.5–1.0 wt% HF solution while keeping the anodizing potential at 3–5 V. The porous TiO2 films were characterized using scanning electron microscopy and x-ray diffraction techniques, and their formation conditions are discussed. In addition, a growth mechanism model is presented to explain the formation of different surface structures.
68.35.B- Structure of clean surfaces (and surface reconstruction)
68.37.Hk Scanning electron microscopy (SEM) (including EBIC)
Issue 3 (14 February 2006)
Received 24 October 2005
Published 10 January 2006
Xiaofeng Yu et al 2006 Nanotechnology 17 808
Leaf Turner and Jane Pratt 2002 J. Phys. A: Math. Gen. 35 781
Rüdiger Kessel et al 2006 Metrologia 43 S189
E C Zeeman 2002 Nonlinearity 15 1993
R J Petti 2006 Class. Quantum Grav. 23 737
Sergey Yu Krylov and Joost W M Frenken 2007 New J. Phys. 9 398
Zafar Ahmed 2009 J. Phys. A: Math. Theor. 42 472005
L H Liang et al 2003 Nanotechnology 14 438
Adriaan M H van der Veen and Maurice G Cox 2003 Metrologia 40 18
I Marshall et al 1991 Clin. Phys. Physiol. Meas. 12 131