Sabrina Brieger et al 2006 Nanotechnology 17 4991 doi:10.1088/0957-4484/17/19/036
Sabrina Brieger, Oliver Dubbers, Sebastian Fricker, Achim Manzke, Christian Pfahler, Alfred Plettl and Paul Ziemann
Show affiliationsA nanolithographic process is introduced based on the self-organization of gold salt loaded inverse micelles formed by poly(styrene)-block-poly(2-vinylpyridine) di-block-copolymers in toluene. The developed procedure allows the fabrication of hexagonally arranged cylindrical nanoholes (diameters ≥20 nm, aspect ratios ~7) in crystalline as well as in amorphous Si. In the latter case, applying the concept to amorphous Si layers evaporated onto any substrate results in nanomasks allowing the transfer of the hole pattern into the substrate.
81.16.Rf Nanoscale pattern formation
81.65.Cf Surface cleaning, etching, patterning
68.37.Hk Scanning electron microscopy (SEM) (including EBIC)
Issue 19 (14 October 2006)
Received 26 June 2006, in final form 29 August 2006
Published 15 September 2006
Sabrina Brieger et al 2006 Nanotechnology 17 4991
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