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Hot filament chemical vapour deposition processing of titanate nanotube coatings

V P Godbole1,3, G S Kim1, M A Dar1, Y S Kim1, H K Seo1, G Khang2 and H S Shin1,4

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In the present paper, we report on the processing of titanate nanotubes using the hot filament chemical vapour deposition (HF-CVD) method to synthesize titania–carbon nanotube–wire composites. The titanate nanotubes are prepared using a chemical route, and then deposited on \langle 100\rangle silicon using an electrodeposition method. The HF-CVD is used to process these coatings at different temperatures in vacuum as well as in different concentrations of hydrogen (H2) and methane (CH4) gas mixtures. The evolutions of the surface and precipitation for various phases have been monitored using different characterization techniques. It is observed that titanate nanotubes start disintegrating above Ts~500 °C, and exhibit different types of phase precipitation depending upon the temperature and gas ambient. Under appropriate conditions, the presence of activated hydrogen and carbon radicals leads to the formation of novel architectures of mixtures of nanophases such as carbide, nonstoichiometric titania, carbon nanotubes, and titania decorated carbon nanowires. The results are discussed in terms of reduction in the thermal reaction barrier due to the presence of atomic hydrogen, and the formation of energetic sites during disintegration of titania nanotubes to facilitate nucleation of nanotube and nanowire structures.


PACS

81.16.-c Methods of nanofabrication and processing

68.37.Hk Scanning electron microscopy (SEM) (including EBIC)

81.07.De Nanotubes

81.30.Mh Solid-phase precipitation

61.46.Fg Nanotubes

81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Subjects

Surfaces, interfaces and thin films

Condensed matter: structural, mechanical & thermal

Nanoscale science and low-D systems

Dates

Issue 8 (August 2005)

Received 31 March 2005, in final form 20 April 2005

Published 20 May 2005



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