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Nanostructuring polymers by soft lithography templates realized via ion sputtering

Elisa Mele1, Francesca Di Benedetto1, Roberto Cingolani1, Dario Pisignano1, Andrea Toma2, Francesco Buatier de Mongeot2, Renato Buzio2, Corrado Boragno2, Giuseppe Firpo2, Valentina Mussi2 and Ugo Valbusa2

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We demonstrate that a combination of ion sputtering and soft lithography is an alternative and effective way of nanostructuring soft matter. We create self-organized nanoscale structures on a glass template by irradiating the surface with a defocused, low energy Ar ion beam. Capillary force lithography is then used to transfer the pattern, exploiting the glass transition of polymeric layers. In particular, we demonstrate the pattern transfer of a periodic 150 nm ripple structure onto an organic compound. This new, unconventional combination is then a low-cost strategy that opens the way to a variety of applications in the field of organic-based devices.


PACS

68.49.Sf Ion scattering from surfaces (charge transfer, sputtering, SIMS)

64.70.P- Glass transitions of specific systems

81.16.Nd Nanolithography

82.35.Jk Copolymers, phase transitions, structure

Subjects

Soft matter, liquids and polymers

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Condensed matter: structural, mechanical & thermal

Chemical physics and physical chemistry

Dates

Issue 11 (November 2005)

Received 20 May 2005, in final form 4 August 2005

Published 6 October 2005



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