Elisa Mele et al 2005 Nanotechnology 16 2714 doi:10.1088/0957-4484/16/11/041
Elisa Mele1, Francesca Di Benedetto1, Roberto Cingolani1, Dario Pisignano1, Andrea Toma2, Francesco Buatier de Mongeot2, Renato Buzio2, Corrado Boragno2, Giuseppe Firpo2, Valentina Mussi2 and Ugo Valbusa2
Show affiliationsWe demonstrate that a combination of ion sputtering and soft lithography is an alternative and effective way of nanostructuring soft matter. We create self-organized nanoscale structures on a glass template by irradiating the surface with a defocused, low energy Ar ion beam. Capillary force lithography is then used to transfer the pattern, exploiting the glass transition of polymeric layers. In particular, we demonstrate the pattern transfer of a periodic 150 nm ripple structure onto an organic compound. This new, unconventional combination is then a low-cost strategy that opens the way to a variety of applications in the field of organic-based devices.
68.49.Sf Ion scattering from surfaces (charge transfer, sputtering, SIMS)
Soft matter, liquids and polymers
Surfaces, interfaces and thin films
Nanoscale science and low-D systems
Issue 11 (November 2005)
Received 20 May 2005, in final form 4 August 2005
Published 6 October 2005
Elisa Mele et al 2005 Nanotechnology 16 2714
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