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Fabrication of GaN nanowires by ammoniating Ga2O3/Al2O3 thin films deposited on Si(111) with radio frequency magnetron sputtering

Chengshan Xue, Qinqin Wei, Zhencui Sun, Zhihua Dong, Haibo Sun and Liwei Shi

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GaN nanowires were synthesized by ammoniating Ga2O3/Al2O3 thin films deposited on Si(111) with radio frequency magnetron sputtering. The cylindrical structures were as long as several micrometres, with diameters ranging between 5 and 40 nm. X-ray diffraction (XRD, Rigaku D/max-rB Cu Kα), scanning electronic microscope (SEM, HitachiH-8010) and high-resolution TEM (HRTEM) results show that most of the GaN nanowires have a single-crystal hexagonal wurtzite structure with major axis [001] alignment. A minority of them are polycrystalline, composed of micrograins with different growth orientations.


PACS

81.07.-b Nanoscale materials and structures: fabrication and characterization

61.46.-w Structure of nanoscale materials

81.16.Be Chemical synthesis methods

68.65.La Quantum wires (patterned in quantum wells)

Subjects

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Dates

Issue 7 (July 2004)

Received 13 November 2003

Published 8 April 2004



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