Alexander Tselev et al 2004 Nanotechnology 15 1475 doi:10.1088/0957-4484/15/11/017
Alexander Tselev1, Kyle Hatton1, Michael S Fuhrer2, Makarand Paranjape1 and Paola Barbara1
Show affiliationsWe have successfully fabricated devices with isolated single-walled carbon nanotubes (SWNTs) using exclusively standard i-line (365 nm) photolithography. Catalyst islands were patterned with an SU-8-photoresist-based process. This method provides well-defined islands, down to 1 µm in size. The islands are clearly visible with an optical microscope and are used as alignment marks for optical alignment of subsequent layers. SWNTs were grown by chemical vapour deposition (CVD). Contacts to the nanotubes were fabricated by standard photolithography.
81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)
Issue 11 (November 2004)
Received 23 April 2004, in final form 3 August 2004
Published 3 September 2004
Alexander Tselev et al 2004 Nanotechnology 15 1475
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