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The growth of freestanding single carbon nanotube arrays

Do-Hyung Kim1, Dong-Soo Cho1, Hoon-Sik Jang1, Chang-Duk Kim2 and Hyeong-Rag Lee1

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Regular arrays of freestanding single carbon nanotubes (CNTs) were prepared on Ni dot arrays by dc plasma-enhanced chemical vapour deposition. The size of the Ni dot was reduced for single CNT growth by means of conventional photolithography and a lateral wet-etch process. The vertical alignment of a single CNT was directly dependent on the location of the catalyst metals. Using this method, well-separated and well-defined regular arrays of freestanding CNTs can be fabricated and the process can be scaled up at a lower cost than electron beam lithography, which is encouraging for applications in field emitters and nanoelectrodes.


PACS

81.07.De Nanotubes

81.16.Nd Nanolithography

81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Subjects

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Dates

Issue 12 (December 2003)

Received 5 August 2003, in final form 29 September 2003

Published 22 October 2003



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