I W Hamley 2003 Nanotechnology 14 R39 doi:10.1088/0957-4484/14/10/201
I W Hamley
Show affiliationsA brief overview is provided of recent developments in the use of block copolymer self-assembly to create morphologies that may be used to template the fabrication of nanostructures in other materials. The patterning of semiconductor surfaces using block copolymer film masks and the production of high-density arrays of magnetic domains are discussed. The use of block copolymer micelles as 'nanoreactors' to prepare metal and semiconductor nanoparticles is considered, and methods to pattern nanoparticles are highlighted. A number of approaches to design nanocapsules are summarized. Finally, applications of bulk nanostructures to make mesoporous materials with controlled pore structures and sizes, or to create photonic crystals, are discussed.
61.41.+e Polymers, elastomers, and plastics
68.47.Fg Semiconductor surfaces
61.46.-w Structure of nanoscale materials
Soft matter, liquids and polymers
Issue 10 (October 2003)
Received 4 July 2003, in final form 29 July 2003
Published 17 September 2003
I W Hamley 2003 Nanotechnology 14 R39
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